Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment

Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment

The wastewater from Chemical Mechanical Polishing (CMP) generated in the semiconductor industry contains a significant concentration of suspended particles and necessitates rigorous treatment to meet environmental standards. Ceramic ultrafiltration membranes offer significant advantages in treating...

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Bibliographic Details
Main Authors: Shining Geng, Dazhi Chen, Zhenghua Guo, Qian Li, Manyu Wen, Jiahui Wang, Kaidi Guo, Jing Wang, Yu Wang, Liang Yu, Xinglong Li, Xiaohu Li
Format: Article
Language:English
Published: MDPI AG 2025-04-01
Series:Membranes
Subjects:
chemical mechanical polishing wastewater
ceramic membrane
halloysite nanotubes
high flux
ultrafiltration
Online Access:https://www.mdpi.com/2077-0375/15/5/130
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