Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment

The wastewater from Chemical Mechanical Polishing (CMP) generated in the semiconductor industry contains a significant concentration of suspended particles and necessitates rigorous treatment to meet environmental standards. Ceramic ultrafiltration membranes offer significant advantages in treating...

Full description

Saved in:
Bibliographic Details
Main Authors: Shining Geng, Dazhi Chen, Zhenghua Guo, Qian Li, Manyu Wen, Jiahui Wang, Kaidi Guo, Jing Wang, Yu Wang, Liang Yu, Xinglong Li, Xiaohu Li
Format: Article
Language:English
Published: MDPI AG 2025-04-01
Series:Membranes
Subjects:
Online Access:https://www.mdpi.com/2077-0375/15/5/130
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1849327240078163968
author Shining Geng
Dazhi Chen
Zhenghua Guo
Qian Li
Manyu Wen
Jiahui Wang
Kaidi Guo
Jing Wang
Yu Wang
Liang Yu
Xinglong Li
Xiaohu Li
author_facet Shining Geng
Dazhi Chen
Zhenghua Guo
Qian Li
Manyu Wen
Jiahui Wang
Kaidi Guo
Jing Wang
Yu Wang
Liang Yu
Xinglong Li
Xiaohu Li
author_sort Shining Geng
collection DOAJ
description The wastewater from Chemical Mechanical Polishing (CMP) generated in the semiconductor industry contains a significant concentration of suspended particles and necessitates rigorous treatment to meet environmental standards. Ceramic ultrafiltration membranes offer significant advantages in treating such high-solid wastewater, including a high separation efficiency, environmental friendliness, and straightforward cleaning and maintenance. However, the preparation of high-precision ceramic ultrafiltration membranes with a smaller pore size (usually <20 nm) is very complicated, requiring the repeated construction of transition layers, which not only increases the time and economic costs of manufacturing but also leads to an elevated transport resistance. In this work, halloysite nanotubes (HNTs), characterized by their high aspect ratio and lumen structure, were utilized to create a high-porosity transition layer using a spray-coating technique, onto which a γ-Al<sub>2</sub>O<sub>3</sub> ultrafiltration selective layer was subsequently coated. Compared to the conventional α-Al<sub>2</sub>O<sub>3</sub> transition multilayers, the HNTs-derived transition layer not only had an improved porosity but also had a reduced pore size. As such, this strategy tended to simplify the preparation process for the ceramic membranes while reducing the transport resistance. The resulting high-flux γ-Al<sub>2</sub>O<sub>3</sub> ultrafiltration membranes were used for the high-efficiency treatment of CMP wastewater, and the fouling behaviors were investigated. As expected, the HNTs-mediated γ-Al<sub>2</sub>O<sub>3</sub> ultrafiltration membranes exhibited excellent water flux (126 LMH) and high rejection (99.4%) of inorganic particles in different solvent systems. In addition, such membranes demonstrated good operation stability and regeneration performance, showing promise for their application in the high-efficiency treatment of CMP wastewater in the semiconductor industry.
format Article
id doaj-art-4dceb82cb4d54dcb95db3ef1b73974b8
institution Kabale University
issn 2077-0375
language English
publishDate 2025-04-01
publisher MDPI AG
record_format Article
series Membranes
spelling doaj-art-4dceb82cb4d54dcb95db3ef1b73974b82025-08-20T03:47:57ZengMDPI AGMembranes2077-03752025-04-0115513010.3390/membranes15050130Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater TreatmentShining Geng0Dazhi Chen1Zhenghua Guo2Qian Li3Manyu Wen4Jiahui Wang5Kaidi Guo6Jing Wang7Yu Wang8Liang Yu9Xinglong Li10Xiaohu Li11Beijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, ChinaBeijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, ChinaBeijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, ChinaBeijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, ChinaBeijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, ChinaBeijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, ChinaBeijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, ChinaBeijing Institute of Technology, Zhengzhou Academy of Intelligent Technology, Zhengzhou 450000, ChinaChongqing Advanced Materials Institute (CAMI), Chongqing 408000, ChinaBeijing Key Laboratory of Photoelectronic/Electrophotonic Conversion Materials, Key Laboratory of Cluster Science, Ministry of Education, Advanced Technology Research Institute (Jinan), Beijing Institute of Technology Chongqing Innovation Center, Advanced Research Institute of Multidisciplinary Science, School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 100081, ChinaGuangdong Guoyu Equipment Co., Ltd., Foshan 528222, ChinaSchool of Materials Science & Engineering, Beihang University, Beijing 102206, ChinaThe wastewater from Chemical Mechanical Polishing (CMP) generated in the semiconductor industry contains a significant concentration of suspended particles and necessitates rigorous treatment to meet environmental standards. Ceramic ultrafiltration membranes offer significant advantages in treating such high-solid wastewater, including a high separation efficiency, environmental friendliness, and straightforward cleaning and maintenance. However, the preparation of high-precision ceramic ultrafiltration membranes with a smaller pore size (usually <20 nm) is very complicated, requiring the repeated construction of transition layers, which not only increases the time and economic costs of manufacturing but also leads to an elevated transport resistance. In this work, halloysite nanotubes (HNTs), characterized by their high aspect ratio and lumen structure, were utilized to create a high-porosity transition layer using a spray-coating technique, onto which a γ-Al<sub>2</sub>O<sub>3</sub> ultrafiltration selective layer was subsequently coated. Compared to the conventional α-Al<sub>2</sub>O<sub>3</sub> transition multilayers, the HNTs-derived transition layer not only had an improved porosity but also had a reduced pore size. As such, this strategy tended to simplify the preparation process for the ceramic membranes while reducing the transport resistance. The resulting high-flux γ-Al<sub>2</sub>O<sub>3</sub> ultrafiltration membranes were used for the high-efficiency treatment of CMP wastewater, and the fouling behaviors were investigated. As expected, the HNTs-mediated γ-Al<sub>2</sub>O<sub>3</sub> ultrafiltration membranes exhibited excellent water flux (126 LMH) and high rejection (99.4%) of inorganic particles in different solvent systems. In addition, such membranes demonstrated good operation stability and regeneration performance, showing promise for their application in the high-efficiency treatment of CMP wastewater in the semiconductor industry.https://www.mdpi.com/2077-0375/15/5/130chemical mechanical polishing wastewaterceramic membranehalloysite nanotubeshigh fluxultrafiltration
spellingShingle Shining Geng
Dazhi Chen
Zhenghua Guo
Qian Li
Manyu Wen
Jiahui Wang
Kaidi Guo
Jing Wang
Yu Wang
Liang Yu
Xinglong Li
Xiaohu Li
Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment
Membranes
chemical mechanical polishing wastewater
ceramic membrane
halloysite nanotubes
high flux
ultrafiltration
title Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment
title_full Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment
title_fullStr Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment
title_full_unstemmed Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment
title_short Halloysite-Nanotube-Mediated High-Flux γ-Al<sub>2</sub>O<sub>3</sub> Ultrafiltration Membranes for Semiconductor Wastewater Treatment
title_sort halloysite nanotube mediated high flux γ al sub 2 sub o sub 3 sub ultrafiltration membranes for semiconductor wastewater treatment
topic chemical mechanical polishing wastewater
ceramic membrane
halloysite nanotubes
high flux
ultrafiltration
url https://www.mdpi.com/2077-0375/15/5/130
work_keys_str_mv AT shininggeng halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT dazhichen halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT zhenghuaguo halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT qianli halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT manyuwen halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT jiahuiwang halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT kaidiguo halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT jingwang halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT yuwang halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT liangyu halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT xinglongli halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment
AT xiaohuli halloysitenanotubemediatedhighfluxgalsub2subosub3subultrafiltrationmembranesforsemiconductorwastewatertreatment