Application of Surface Complexation Modeling to Investigate the Mechanism of Cu<sup>2+</sup> Adsorption on TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, and SiO<sub>2</sub> Under High Surface Coverage

Application of Surface Complexation Modeling to Investigate the Mechanism of Cu<sup>2+</sup> Adsorption on TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>, and SiO<sub>2</sub> Under High Surface Coverage

We have shown that the adsorption of Cu<sup>2+</sup> ions on various metal oxides, depending on the pH of the solution, can be described assuming the formation of only two surface complexes with surface hydroxyl groups SOH: SOCu(OH) and SOCu<sup>+</sup>. Using an ion-selectiv...

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Bibliographic Details
Main Authors: Wojciech Piasecki, Karolina Lament
Format: Article
Language:English
Published: MDPI AG 2024-11-01
Series:Molecules
Subjects:
copper adsorption
metal oxide
surface complexation modeling
hydrogen surface charge
electrokinetic potential
Cu-ISE
Online Access:https://www.mdpi.com/1420-3049/29/23/5595
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