Flow Rate-Driven Morphology Evolution of Chemical Vapor Deposited WS<sub>2</sub> at Varying Temperatures

Flow Rate-Driven Morphology Evolution of Chemical Vapor Deposited WS<sub>2</sub> at Varying Temperatures

Due to its unique electronic and optical properties, tungsten disulfide (WS<sub>2</sub>) is a promising material for various device applications. However, achieving an efficient and cost-effective method for synthesizing large-area uniform WS<sub>2</sub> is still challenging....

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Bibliographic Details
Main Authors: Himal Pokhrel, Sanjay Mishra, Shawn Pollard
Format: Article
Language:English
Published: MDPI AG 2024-10-01
Series:Solids
Subjects:
2D materials
chemical vapor deposition
transition metal dichalcogenides
thin film growth
Online Access:https://www.mdpi.com/2673-6497/5/4/34
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