Pokhrel, H., Mishra, S., & Pollard, S. Flow Rate-Driven Morphology Evolution of Chemical Vapor Deposited WS<sub>2</sub> at Varying Temperatures. MDPI AG.
Chicago Style (17th ed.) CitationPokhrel, Himal, Sanjay Mishra, and Shawn Pollard. Flow Rate-Driven Morphology Evolution of Chemical Vapor Deposited WS<sub>2</sub> at Varying Temperatures. MDPI AG.
MLA (9th ed.) CitationPokhrel, Himal, et al. Flow Rate-Driven Morphology Evolution of Chemical Vapor Deposited WS<sub>2</sub> at Varying Temperatures. MDPI AG.
Warning: These citations may not always be 100% accurate.