Oshima, T., Togashi, R., & Oshima, Y. Plasma-free anisotropic selective-area etching of β-Ga2O3 using forming gas under atmospheric pressure. Taylor & Francis Group.
Chicago Style (17th ed.) CitationOshima, Takayoshi, Rie Togashi, and Yuichi Oshima. Plasma-free Anisotropic Selective-area Etching of β-Ga2O3 Using Forming Gas Under Atmospheric Pressure. Taylor & Francis Group.
MLA (9th ed.) CitationOshima, Takayoshi, et al. Plasma-free Anisotropic Selective-area Etching of β-Ga2O3 Using Forming Gas Under Atmospheric Pressure. Taylor & Francis Group.
Warning: These citations may not always be 100% accurate.