CARBIDE FILM FILMS BY CHEMICAL DEPOSITION FROM THE GAS PHASE IN A REACTOR WITH COLD WALLS
The technique of obtaining and the first results of studying thin crystalline silicon carbide films by deposition from a gas phase in a reactor with cold walls is presented in the article. Trimethylchlorosilane was used as the precursor material, nitrogen was used as the carrier gas for the formatio...
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| Format: | Article |
| Language: | Russian |
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North Caucasus Federal University
2022-05-01
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| Series: | Вестник Северо-Кавказского федерального университета |
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| Online Access: | https://vestnikskfu.elpub.ru/jour/article/view/851 |
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| _version_ | 1849243810946613248 |
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| author | Vladimir Martens Svyatoslav Krandievsky Ilya Nikitin |
| author_facet | Vladimir Martens Svyatoslav Krandievsky Ilya Nikitin |
| author_sort | Vladimir Martens |
| collection | DOAJ |
| description | The technique of obtaining and the first results of studying thin crystalline silicon carbide films by deposition from a gas phase in a reactor with cold walls is presented in the article. Trimethylchlorosilane was used as the precursor material, nitrogen was used as the carrier gas for the formation of the vapor-gas mixture. The films were produced on the Easytube 3000 chemical synthesis unit from the manufacturer Firstnano. X-ray patterns of synthesized samples were obtained and investigated. |
| format | Article |
| id | doaj-art-1c3b1ce19d224e8e86a035a763b39f01 |
| institution | Kabale University |
| issn | 2307-907X |
| language | Russian |
| publishDate | 2022-05-01 |
| publisher | North Caucasus Federal University |
| record_format | Article |
| series | Вестник Северо-Кавказского федерального университета |
| spelling | doaj-art-1c3b1ce19d224e8e86a035a763b39f012025-08-20T03:59:21ZrusNorth Caucasus Federal UniversityВестник Северо-Кавказского федерального университета2307-907X2022-05-01032427849CARBIDE FILM FILMS BY CHEMICAL DEPOSITION FROM THE GAS PHASE IN A REACTOR WITH COLD WALLSVladimir Martens0Svyatoslav Krandievsky1Ilya Nikitin2North-Caucasus Federal UniversityNorth-Caucasus Federal UniversityNorth-Caucasus Federal UniversityThe technique of obtaining and the first results of studying thin crystalline silicon carbide films by deposition from a gas phase in a reactor with cold walls is presented in the article. Trimethylchlorosilane was used as the precursor material, nitrogen was used as the carrier gas for the formation of the vapor-gas mixture. The films were produced on the Easytube 3000 chemical synthesis unit from the manufacturer Firstnano. X-ray patterns of synthesized samples were obtained and investigated.https://vestnikskfu.elpub.ru/jour/article/view/851карбид кремниятонкие пленкихимическое осаждениеsilicon carbidethin filmschemical deposition |
| spellingShingle | Vladimir Martens Svyatoslav Krandievsky Ilya Nikitin CARBIDE FILM FILMS BY CHEMICAL DEPOSITION FROM THE GAS PHASE IN A REACTOR WITH COLD WALLS Вестник Северо-Кавказского федерального университета карбид кремния тонкие пленки химическое осаждение silicon carbide thin films chemical deposition |
| title | CARBIDE FILM FILMS BY CHEMICAL DEPOSITION FROM THE GAS PHASE IN A REACTOR WITH COLD WALLS |
| title_full | CARBIDE FILM FILMS BY CHEMICAL DEPOSITION FROM THE GAS PHASE IN A REACTOR WITH COLD WALLS |
| title_fullStr | CARBIDE FILM FILMS BY CHEMICAL DEPOSITION FROM THE GAS PHASE IN A REACTOR WITH COLD WALLS |
| title_full_unstemmed | CARBIDE FILM FILMS BY CHEMICAL DEPOSITION FROM THE GAS PHASE IN A REACTOR WITH COLD WALLS |
| title_short | CARBIDE FILM FILMS BY CHEMICAL DEPOSITION FROM THE GAS PHASE IN A REACTOR WITH COLD WALLS |
| title_sort | carbide film films by chemical deposition from the gas phase in a reactor with cold walls |
| topic | карбид кремния тонкие пленки химическое осаждение silicon carbide thin films chemical deposition |
| url | https://vestnikskfu.elpub.ru/jour/article/view/851 |
| work_keys_str_mv | AT vladimirmartens carbidefilmfilmsbychemicaldepositionfromthegasphaseinareactorwithcoldwalls AT svyatoslavkrandievsky carbidefilmfilmsbychemicaldepositionfromthegasphaseinareactorwithcoldwalls AT ilyanikitin carbidefilmfilmsbychemicaldepositionfromthegasphaseinareactorwithcoldwalls |