High Linearity and Symmetry Ferroelectric Artificial Neuromorphic Devices Based on Ultrathin Indium‐Tin‐Oxide Channels

Abstract Because of the limitations of the von Neumann structure and transistor size scaling, it is important to find new materials to build ultra‐thin artificial synapse devices. Doped In2O3 has attracted a lot of research due to its excellent on/off ratio, high mobility, and large on‐state current...

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Bibliographic Details
Main Authors: Siwei Wang, Xuemeng Hu, Baifan Qian, Jiajie Yu, Zhenhai Li, Qingqing Sun, David Wei Zhang, Qingxuan Li, Lin Chen
Format: Article
Language:English
Published: Wiley-VCH 2025-08-01
Series:Advanced Electronic Materials
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Online Access:https://doi.org/10.1002/aelm.202500078
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