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Synthesis of Cerium Dioxide High-k Thin Films as a Gate Dielectric in MOS Capacitor by Anil G. Khairnar, Y.S. Mhaisagar, A.M. Mahajan
Published 2013-07-01Get full text
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Deposition and Surface Modification of Low-k Thin Films For ILD Application In ULSI Circuits by Y.S. Mhaisagar, B.N. Joshi, A.M. Mahajan
Published 2011-01-01Get full text
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Surface Passivation of Germanium Using NH3 Ambient in RTP for High Mobility MOS Structure by Anil G. Khairnar, Y.S. Mhaisagar, A.M. Mahajan
Published 2013-05-01Get full text
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