Transmitted electron exposure in electron beam lithography for double-side patterning of bi-layer metasurfaces on a SiNx membrane by Jinyu Guo, Yifei Wang, Hao Quan, Shuoqiu Tian, Qiucheng Chen, Wentao Yuan, Qingxin Wu, Kangping Liu, Yifang Chen, Qiong He, Lei Zhou

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