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    940 nm Micro‐Light‐Emitting Diode Fabricated on Industry‐Compatible 300 mm Si (100) Substrate by Metal–Organic Chemical Vapor Deposition

    940 nm Micro‐Light‐Emitting Diode Fabricated on Industry‐Compatible 300 mm Si (100) Substrate by Metal–Organic Chemical Vapor Deposition by Hadi Hijazi, Driss Mouloua, Mattéo Chobe, Léo Mallet‐Dida, Mickael Martin, Jérémy Moeyaert, Sébastien Cavalaglio, Nathalia Massara, Juliette Mignot, Jérôme Richy, Philippe Grosse, Jean‐Michel Hartmann, Thierry Baron

    Published 2025-08-01
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