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Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal pro... by Nathalie Cadieux, Audrée Bethsa Camille, Jean Cadieux, Marie-Michelle Gouin, Éveline Morin, Pierre-Luc Fournier
Published 2024-12-01Get full text
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