25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography by Zhi Chen, Lijing Zhong, Xiangyu Sun, Yihui Fu, Huilin He, Huijiao Ji, Yuying Wang, Xiaofeng Liu, Beibei Xu, Zhemin Wu, Chen Zou, Zhijun Ma, Jingyu Zhang, Guoping Dong, Giuseppe Barillaro, Cheng-Wei Qiu, Jianbei Qiu, Jianrong Qiu

Get full text