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    Promoting effect of interfacial hole accumulation on photoelectrochemical water oxidation in BiVO4 and Mo-doped BiVO4

    Promoting effect of interfacial hole accumulation on photoelectrochemical water oxidation in BiVO4 and Mo-doped BiVO4 by Xiaofeng Wu, Freddy E. Oropeza, Shixin Chang, Marcus Einert, Qingyang Wu, Clément Maheu, Julia Gallenberger, Chuanmu Tian, Kangle Lv, Jan P. Hofmann

    Published 2024-12-01
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